Multizone uniformity control of a chemical mechanical polishing process utilizing a pre- and postmeasurement strategy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 I, 2000, Pages 1287-1296

  El Chemali, Chadi ^a   Moyne, James ^a   Khan, Kareemullah ^a   Nadeau, Rock ^b   Smith, Paul ^b   Colt, John ^b   Chapple Sokol, Jonathan ^b   Parikh, Tarun ^c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b IBM   (United States)

^c SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; APPROXIMATION THEORY; CHEMICAL POLISHING; COMPUTER CONTROL SYSTEMS; CONTROL SYSTEM SYNTHESIS; MATHEMATICAL MODELS; MULTIVARIABLE CONTROL SYSTEMS; PROCESS CONTROL;

CHEMICAL MECHANICAL POLISHING (CMP); MULTIZONE UNIFORMITY CONTROL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0034229037     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582342     Document Type: Article

References (17)

1. W. Rozich, SEMATECH AEC/APC Symposium XI, Vail, Colorado, September 1999 (unpublished).
2. J. Baliga, Semicond. Int. 22, 76 (1999).
3. J. Moyne, SEMATECH AEC Workshop VIII, Santa Fe, NM, October 1996 (unpublished).
4. S. Leang, S. Ma, J. Thomson, B. J. Bombay, and C. J. Spanos, IEEE Trans. Semicond. Manuf. 9, 191 (1996).
5. M. S. Le, T. E. Smith, D. S. Boning, and H. H. Sawin, Proceedings of Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing II, ECS Meeting, Montreal, May 1997 (unpublished).
6. SEMATECH AEC/APC Symposium XI Proceedings, Vail, CO, September 1999 (unpublished).
7. J. Moyne, J. Curry, V. Solakhian, T. Weaver, and R. Gwizdak, Advanced Semiconductor Manufacturing Conference: SEMICON Taiwan, November 1998 (unpublished).
8. J. Moyne et al., SEMATECH AEC/APC Workshop IX, Lake Tahoe, September 1997 (unpublished).
9. W. Jarrett Campbell, SEMATECH AEC/APC Symposium XI, Vail, CO, September 1999 (unpublished).
10. S. Ha and E. Sachs, IEEE Trans. Semicond. Manuf. 12, 200 (1999).
11. C. El Chemali et al., 25th IEEE/CPMT International Electronics Manufacturing Technology Symposium, Austin, TX, October 1999 (unpublished).
12. J. Moyne, SEMATECH Technology Transfer Document No. 99023670A-Tech. Rep. (January 1999).
13. SEMATECH Advanced Process Control Framework Initiative, SEMATECH Technology Transfer Document No. 99053735A-Tech. Rep. (June 1999).
14. J. Moyne, United States Patent No. 5,469,361 (Filed, August 1991; issued, November 1995).
15. T. Smith, M.S. thesis, Electrical Engineering and Computer Science, MIT, June 1996.
16. C. C. Montgomery, Design and Analysis of Experiments, 3rd ed. (Wiley, New York, 1991).
17. D. Boning et al., Proceedings 6th Annual SEMI/IEEE ASMC, Boston, MA (November 1995) (unpublished).