Characterization of amorphous and crystalline silicon nanoclusters in ultra thin silica layers

Journal of Applied Physics

Volumn 104, Issue 9, 2008, Pages

  Thogersen, Annett ^a   Mayandi, Jeyanthinath ^a   Finstad, Terje G ^a   Olsen, Arne ^a   Christensen, Jens Sherman ^a   Mitome, Masanori ^b   Bando, Yoshio ^b  

^a UNIVERSITY OF OSLO   (Norway)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CONCENTRATION (PROCESS); HEAT TREATING FURNACES; HEAT TREATMENT; MASS SPECTROMETRY; MICROSCOPIC EXAMINATION; NANOCLUSTERS; NANOCRYSTALLINE ALLOYS; NANOCRYSTALS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NONMETALS; OXYGEN; REGENERATORS; SECONDARY ION MASS SPECTROMETRY; SILICA; SILICON; STACKING FAULTS; SURFACE TREATMENT;

AMORPHOUS SILICON NANOCLUSTERS; CRYSTALLINE SILICONS; ELECTRONIC DEVICES; ENERGY FILTERED TEM; EXCESS SI; HIGH RESOLUTIONS; HIGH TEMPERATURES; IMAGE SIMULATIONS; IN-SITU; PREPARATION CONDITIONS; RAPID THERMAL OXIDATIONS; SAMPLE SURFACES; SECONDARY ION MASS SPECTROSCOPIES; SI DIFFUSIONS; SI LAYERS; SI SUBSTRATES; SILICA LAYERS; SILICON CONCENTRATIONS; SILICON NANOCRYSTALS; SILICON RICH OXIDES; TOP SURFACES; TWIN BOUNDARIES;

AMORPHOUS SILICON;

EID: 56349092510     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3014195     Document Type: Article

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