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Volumn 230, Issue 1-4, 2005, Pages 198-202
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Effect of Si implantation on the microstructure of silicon nanocrystals and surrounding SiO2 layer
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Author keywords
Dark field imaging; Luminescence; Monte Carlo simulation; Si nanocrystals; Transmission electron microscopy; X ray photoelectron spectroscopy
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Indexed keywords
FUSED SILICA;
ION IMPLANTATION;
MICROSTRUCTURE;
MONTE CARLO METHODS;
NANOSTRUCTURED MATERIALS;
OPTOELECTRONIC DEVICES;
PHOTOLUMINESCENCE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
QUANTUM THEORY;
SILICA;
SPECTROMETERS;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY PHOTOELECTRON SPECTROSCOPY;
DARK-FIELD MICROSCOPY;
QUANTUM CONFINEMENT;
SI NANOCRYSTALS;
SILICON STRUCTURES;
SILICON;
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EID: 14744287114
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2004.12.040 Document Type: Conference Paper |
Times cited : (18)
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References (12)
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