Defects and nanocrystals generated by Si implantation into a-SiO2

IEEE Transactions on Nuclear Science

Volumn 47, Issue 6 III, 2000, Pages 2269-2275

  Nicklaw, C J ^a   Pagey, M P ^a   Pantelides, S T ^a   Fleetwood, D M ^a   Schrimpf, R D ^a   Galloway, K F ^a   Wittig, J E ^a   Howard, B M ^b   Taw, E ^b   McNeil, W H ^b   Conley Jr , J F ^b,c  

^a VANDERBILT UNIVERSITY   (United States)

^b DYNAMICS RESEARCH CORPORATION   (United States)

^c CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPACITANCE MEASUREMENT; CRYSTAL ATOMIC STRUCTURE; CRYSTAL DEFECTS; ELECTRIC CHARGE; ELECTRON SPIN RESONANCE SPECTROSCOPY; NANOSTRUCTURED MATERIALS; PROBABILITY DENSITY FUNCTION; SEMICONDUCTING SILICON; SILICA; TRANSMISSION ELECTRON MICROSCOPY; VOLTAGE MEASUREMENT;

DENSITY FUNCTIONAL THEORY; ELECTRICAL CHARGE TRAPPING CHARACTERISTICS; NANOCRYSTALS; SILICON IMPLANTATION; THERMAL OXIDES;

ION IMPLANTATION;

EID: 0034451094     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.903764     Document Type: Conference Paper

References (22)

1. Evidence for a deep electron trap and charge compensation in SIMOX oxides
2. TM substrates
3. A comprehensive physically based predictive model for radiation damage in MOS system
4. 2 layers formed by oxygen ion implantation in silicon
5. Radiation induced charge in SIMOX buried oxides: Lack of thickness dependence at low applied fields
6. 2 films using spectroscopic ellipsometry
7. 2
8. Paramagnetic defect centers in BESOI and SIMOX buried oxides
9. Correlation between luminescence and structural properties of Si nanocrystals
10. 2 matrix by ion implantation
11. 2
12. Photoluminescence and paramagnetic defects in silicon-implanted silicon dioxide layers
13. 2
14. Light emission from thermally oxidized silicon nanoparticles
15. Light-emission from crystalline silicon and amorphous-silicon oxide (SIOX) nanoparticles
16. Study of photoluminescence in nanocrystalline silicon/amorphous silicon multilayers
17. Visible luminescence from one- and two-dimensional silicon structures produced by conventional lithographic and reactive ion etching techniques
18. +-implanted thermal oxide films on crystalline Si
19. 2 layers
20. 2 formed by ion implantation