Effects of additives on the selectivity of byproducts and dry removal of fluorine for abating tetrafluoromethane in a discharge reactor

Journal of Hazardous Materials

Volumn 161, Issue 2-3, 2009, Pages 1478-1483

  Tsai, Cheng Hsien ^a   Kuo, Zhao Zhi ^a  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

Author keywords

Absorption; Decomposition; Fluorine; Plasma; Tetrafluoromethane

Indexed keywords

ABSORPTION; CURING; DISCHARGE (FLUID MECHANICS); FLUORINE; MICROWAVES; ORGANIC POLYMERS; PLASMA APPLICATIONS; PLASMAS; REMOVAL;

CHEMICAL ABSORPTION PROCESSES; DISCHARGE REACTORS; DISCHARGE ZONES; IN-SITU; MICROWAVE PLASMA REACTORS; PLASMA REACTORS; REMOVAL EFFICIENCIES; TETRAFLUOROMETHANE;

ELECTRIC DISCHARGES;

CARBON TETRAFLUORIDE; FLUORINE; METHANE; UNCLASSIFIED DRUG;

ABSORPTION; ATMOSPHERIC PRESSURE; DECOMPOSITION; FLUORINE; PLASMA;

ABSORPTION; ARTICLE; CHEMICAL REACTION; FLAME PHOTOMETRY; REACTOR;

ABSORPTION; AIR POLLUTANTS; ATMOSPHERE; BIOREACTORS; EQUIPMENT DESIGN; FLUORINE; HYDROCARBONS, FLUORINATED; HYDROGEN; INDUSTRIAL WASTE; METHANE; MICROWAVES; OXYGEN; PRESSURE; SOLUBILITY; TEMPERATURE; WATER;

EID: 56249083865     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2008.04.118     Document Type: Article

References (40)

1. 2 as an additive gas. IEEE Trans. Plasma Sci. 10 (1997) 399-407
2. Hannus I. Adsorption and transformation of halogenated hydrocarbons over zeolites. Appl. Catal. A 189 (1999) 263-276
3. 4 over alumina-based binary metal oxide catalysts. Appl. Catal. B Environ. 40 (2003) 81-91
4. Liao M.Y., Wong K., McVittle J.P., and Saraswat K.C. Abatement of perfluorocarbons with an inductively coupled plasma reactor. J. Vac. Sci. Technol. B 17 (1999) 2638-2643
5. 4 containing semiconductor process emissions. Environ. Sci. Technol. 33 (1999) 1892-1897
6. Xu X.P., Rauf S., and Kushner M.J. Plasma abatement of perfluorocompounds in inductively coupled plasma reactors. J. Vac. Sci. Technol. A 18 (2000) 213-231
7. 2O as additive gases. J. Vac. Sci. Technol. A 18 (2000) 393-400
8. 2/Ar mixtures in an inductively coupled plasma. J. Appl. Phys. 93 (2003) 5053-5062
9. 4 decomposition of flue gas from semiconductor process using inductively coupled plasma. IEEE Trans. Ind. Appl. 41 (2005) 221-228
10. Lee H.M., Chang M.B., and Lu R.F. Abatement of perfluorocompounds by tandem packed-bed plasmas for semiconductor manufacturing processes. Ind. Eng. Chem. Res. 44 (2005) 5526-5534
11. Hong Y.C., Kim H.S., and Uhm H.S. Reduction of perfluorocompound emissions by microwave plasma-torch. Thin Solid Films 435 (2003) 329-334
12. Chang M.B., and Lee H.M. Abatement of perfluorocarbons with combined plasma catalysis in atmospheric-pressure environment. Catal. Today 89 (2004) 109-115
13. Uhm H.S., Hong Y.C., and Shin D.H. A microwave plasma torch and its applications. Plasma Sources Sci. Technol. 15 (2006) S26-S34
14. 4 using an enhanced kerosene microwave plasma burner. Phys. Plasmas 13 (2006) 114504
15. 4 abatement. Res. Chem. Intermed. 27 (2001) 957-974
16. Nagai M., Hori M., and Goto T. Decomposition and polymerization of perfluorinated compounds in microwave excited atmospheric pressure plasma. J. Appl. Phys. 97 (2005) 123304-1-123304-5
17. Fiala A., Kiehlbauch M., Mahnovske S., and Graves B. Model of point-of-use plasma abatement of perfluorinated compounds with an inductively coupled plasma. J. Appl. Phys. 86 (1999) 152-162
18. 4. Environ. Sci. Technol. 37 (2003) 3985-3988
19. Radoiu M.T. Studies on atmospheric plasma abatement of PFCs. Radiat. Phys. Chem. 69 (2004) 113-120
20. 6. IEEE Proc. 137 Pt. A (1999) 221-227
21. Byer S.G., Wong C., Yang R.T., and Reinhardt J.R. Kinetics of the reaction between HF and CaO for fluoride emission control. Environ. Sci. Technol. 17 (1983) 84-88
22. Kossaya A.M., Sandrozd M.K., Kuchma Z.V., Belyakov B.P., and Vasil'eva V.G. Kinetics of the reactions of hydrogen fluoride with calcium oxide. J. Appl. Chem. USSR 59 (1986) 147-149
23. Breitbarth F.W., Berg D., Dumke K., and Tiller H.J. Investigation of the low-pressure plasma-chemical conversion of fluorocarbon waste gases. Plasma Chem. Plasma Process. 17 (1997) 39-57
24. 4 in a tubular-alumina fast-flow reactor. J. Appl. Phys. 50 (1979) 4982-4987
25. Kabouzi Y., Mosan M., Rostaing J.C., Trassy C., Gue'rin D., Ke'rock D., and Zakrzewski Z. Abatement of perfluorinated compounds using microwave plasma at atmospheric pressure. J. Appl. Phys. 93 (2003) 9483-9496
26. Lee H.M., Chang M.B., and Kuan Y.W. Abatement of sulfur hexafluoride emissions from the semiconductor manufacturing process by atmospheric pressure plasma. J. Air Waste Manage. Assoc. 54 (2004) 960-970
27. Yu Q.S., Krentsel E., and Yasuda H.K. Optical emission diagnostics in cascade arc plasma polymerization and surface modification progresses. J. Polym. Sci. Polym. Chem. 36 (1998) 1583-1592
28. Timmermans E.A.H., Jonkers J., Rodero A., Quintero M.C., Sola A., Gamero A., Schram D.C., and van der Mullen J.A.M. The behavior of molecules in microwave-induced plasmas studied by optical emission spectroscopy. 2: Plasmas at reduced pressure. Spectrochim. Acta B 54 (1999) 1085-1098
29. 2O and NO sources: from the viewpoint of ZnO. J. Appl. Phys. 95 (2004) 5882-5888
30. Liang H.W., Lu Y.M., Shen D.Z., Liu Y.C., Yan J.F., Shan C.X., Li B.H., Zhang Z.Z., Zhang J.Y., and Fan X.W. P-type ZnO thin films prepared by plasma molecular beam epitaxy using radical NO. Phys. Stat. Solidi A 202 (2005) 1060-1065
31. Tsai C.H., Yang H.H., Jou C.J.G., and Lee H.M. Reducing nitric oxide into nitrogen via a radio-frequency discharge. J. Hazard. Mater. 143 (2007) 409-414
32. 4/Ar plasma. J. Appl. Phys. 71 (1992) 3186-3192
33. Ricard A. The production of active plasma species for surface treatments. J. Phys. D: Appl. Phys. 30 (1997) 2261-2269
34. Lieberman M.A., and Lichtenberg A.J. Principle of Plasma Discharges and Materials Processing (1994), Wiley, New York pp. 497-502
35. Duman E.L., Tishchenko N.P., and Shmatov I.P. Rate-constant for 3-body recombination of atomic fluorine. Dokl. Akad. Nauk. SSSR 292 (1987) 111-114
36. Tsang W. Chemical kinetic database for propellant combustion. II. Reactions involving CN, NCO, and HNCO. J. Phys. Chem. Ref. Data 21 (1992) 753-791
37. x deposition assisted by rf plasma. Surf. Coat. Technol. (2004) 188-189
38. Hueso J.L., Gonzalez-Elipe A.R., Cotrino J., and Caballero A. Plasma chemistry of NO in complex gas mixtures excited with a surfatron launcher. J. Phys. Chem. A 109 (2005) 4930-4938
39. Balcerowiak W.J. Phase analysis of high-calcium lime by TG. Therm. Anal. Calorim. 60 (2000) 67-70
40. 2 decomposed in an rf plasma environment. Chemosphere 62 (2006) 1681-1688