Abatement of perfluorocarbons with an inductively coupled plasma reactor

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2638-2643

  Liao, M Y ^a   Wong, K ^a   McVittie, J P ^a   Saraswat, K C ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033261754     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591038     Document Type: Article

References (3)

1. Report on an Independent Evaluation of Edwards TPU4200.
2. V. Mohindra, H. Chae, H. H. Sawin, and M. T. Mocella, Proc. IEEE 10, 399 (1997).
3. 4 from SEMATECH report, 14 October 1997.