Reduction of perfluorocompound emissions by microwave plasma-torch

Thin Solid Films

Volumn 435, Issue 1-2, 2003, Pages 329-334

  Hong, Yong C ^a   Kim, Hyoung S ^a   Uhm, Han S ^a  

^a Ajou University   (South Korea)

Author keywords

Additive gas; Destruction and removal efficiency; Microwave plasma torch; Perfluorocompound

Indexed keywords

ATMOSPHERIC PRESSURE; ELECTRODES; FLUORINE COMPOUNDS; GLOBAL WARMING; MICROWAVE DEVICES; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; PLASMA TORCHES; REDUCTION; SURFACE CLEANING;

PLASMA ABATEMENT DEVICES;

DIELECTRIC FILMS;

EID: 0038684625     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00363-8     Document Type: Conference Paper

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