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Volumn 37, Issue 17, 2003, Pages 3985-3988

Studies of 2.45 GHz microwave induced plasma abatement of CF4

Author keywords

[No Author keywords available]

Indexed keywords

GAS MIXTURES;

EID: 0042285953     PISSN: 0013936X     EISSN: None     Source Type: Journal    
DOI: 10.1021/es0263846     Document Type: Article
Times cited : (22)

References (31)
  • 6
    • 0041745231 scopus 로고    scopus 로고
    • An efficient, highly reliable plasma tool for PFC abatement
    • Chen, X.; Holber, W.; Peter, M. An efficient, highly reliable plasma tool for PFC abatement. Proc. Electrochem. Soc. 2000, 2000-7, 9.
    • (2000) Proc. Electrochem. Soc. , vol.7 , pp. 9
    • Chen, X.1    Holber, W.2    Peter, M.3
  • 15
    • 0032181502 scopus 로고    scopus 로고
    • Allgood, C. Adv. Mater. 1998, 10(15), 1239.
    • (1998) Adv. Mater. , vol.10 , Issue.15 , pp. 1239
    • Allgood, C.1
  • 24
    • 0002909577 scopus 로고
    • Combustion flue gas treatment
    • Chang, J. S., Kelly, A. J., Crowley, J. M., Eds.; Marcel Dekker
    • Rea, M. Combustion flue gas treatment. In Handbook of Electrostatic Processes; Chang, J. S., Kelly, A. J., Crowley, J. M., Eds.; Marcel Dekker: 1995; p 607.
    • (1995) Handbook of Electrostatic Processes , pp. 607
    • Rea, M.1
  • 26
    • 0003420567 scopus 로고
    • Moisan, M., Pelletier, J., Eds.; Elsevier Science B.V.
    • Microwave Excited Plasmas in Plasma Technology, Moisan, M., Pelletier, J., Eds.; Elsevier Science B.V.: 1992; Vol. 4.
    • (1992) Microwave Excited Plasmas in Plasma Technology , vol.4
  • 28
    • 0042245777 scopus 로고    scopus 로고
    • National Institute of Standards and Technology, online at webbook.nist.gov/chemistry
    • National Institute of Standards and Technology, online at webbook.nist.gov/chemistry.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.