Preparation of silicon carbide film by a plasma focus device

Physics Letters, Section A: General, Atomic and Solid State Physics

Volumn 372, Issue 48, 2008, Pages 7179-7182

  Wang, Z P ^a   Yousefi, H R ^a   Nishino, Y ^a   Ito, H ^a   Masugata, K ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

Dense plasma focus (DPF); Pulsed electron beam; Silicon carbide (SiC)

Indexed keywords

FIELD EMISSION MICROSCOPES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA DEVICES; PLASMA THEORY; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; X RAY DIFFRACTION;

DENSE PLASMA FOCUS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; MECHANICAL HARDNESS; PLASMA FOCUS DEVICES; PULSED ELECTRON BEAMS; SILICON CARBIDE FILMS; SILICON CARBIDES (SIC); X RAY DIFFRACTOMETERS;

FILM PREPARATION;

EID: 56049090265     PISSN: 03759601     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physleta.2008.10.062     Document Type: Article

References (38)

1. Zolper J.C., and Skowronsky M. Mater. Res. Soc. Bull. 30 (2005) 273
2. Willander M., Friesel M., Wahab Q.-u., and Straumal B. J. Mater. Sci. Mater. Electron. 17 (2006) 1
3. Dimitrijev S., Harrison H.B., Tanner P., Cheong K.Y., and Han J. Properties of nitrided oxides on SiC. In: Choyke W.J., Matsunami H., and Pensl G. (Eds). Silicon Carbide: Recent Major Advances (2004), Springer, Berlin 373-386
4. Nakazawa H., and Suemitsu M. Appl. Phys. Lett. 79 (2001) 755
5. Chen J., Steckl A.J., and Loboda M.J. J. Vac. Sci. Technol. B 16 (1998) 1305
6. Kovats Z., Metzger T.H., Peisl J., Stangl J., Mühlberger M., Zhuang Y., Schäffler F., and Bauer G. Appl. Phys. Lett. 76 (2000) 3409
7. Golecki I., Reidinger F., and Marti J. Appl. Phys. Lett. 60 (1992) 1703
8. Iijima S. Nature 354 (1991) 56
9. Nishiguchi T., Nakamura M., Nishio K., Isshiki T., and Nishino S. Appl. Phys. Lett. 84 (2004) 3082
10. Wang R., Bhat I.B., and Chow T.P. J. Appl. Phys. 92 (2002) 7587
11. Lee C.J., Pezzoti G., Okui Y., and Nishino S. Appl. Surf. Sci. 228 (2004) 10
12. Rajab S.M., Oliveira I.C., Massi M., Maciel H.S., dos Santos Filho S.G., and Mansano R.D. Thin Solid Films 515 (2006) 170
13. Sha Z.D., Wu X.M., and Zhuge L.J. Vacuum 79 (2005) 250
14. Valentini A., Convertino A., Alvisi M., Cingolani R., Ligonzo T., Lamendola R., and Tapfer L. Thin Solid Films 335 (1998) 80
15. Wahab Q., Glass R.C., Ivanov I.P., Birch J., Sundgren J.-E., and Willander M. J. Appl. Phys. 74 (1993) 1663
16. Meltez R.L., de Oliveira R.M., dos Reis R.M.S., and Boudinov H. J. Appl. Phys. 100 (2006) 063504
17. Katharria Y.S., Kumar S., Singh F., Pivin J.C., and Kanjilal D. J. Phys. D: Appl. Phys. 39 (2006) 3969 and references therein
18. Kitabatake M., and Greene J.E. Jpn. J. Appl. Phys. 35 (1996) 5261
19. Bhuyan H., Favre M., Valderrama E., Avaria G., Chuaqui H., Mitchell I., Wyndham E., Saavedra R., and Paulraj M. J. Phys. D: Appl. Phys. 40 (2007) 127
20. Hussain S., Ahmad S., Sharif M., Sadiq M., Waheed A., and Zakaullah M. Phys. Lett. A 349 (2006) 236
21. Zakaullah M., Waheed A., Ahmad S., Zeb S., and Hussain S. Plasma Sources Sci. Technol. 12 (2003) 443
22. Koh J.M., Rawat R.S., Patran A., Zhang T., Wong D., Springham S.V., Tan T.L., Lee S., and Lee P. Plasma Sources Sci. Technol. 14 (2005) 12
23. Yousefi H.R., Mohanty S.R., Nakada Y., Ito H., and Masugata K. Phys. Plasmas 13 (2006) 114506
24. Soto L. Plasma Phys. Control. Fusion 47 (2005) A361
25. Soh L.Y., Lee P., Shuyan X., Lee S., and Rawat R.S. IEEE Trans. Plasma Sci. 32 (2004) 448
26. H.R. Yousefi, Z.P. Wang, Y. Nakada, H. Ito, K. Masugata, Application of Plasma Focus device to Material Processes, The 5th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2007, pp. 179-181
27. Rawat R.S., Lee P., White T., Ying L., and Lee S. Surf. Coat. Tech. 138 (2001) 159
28. Rawat R.S., Chew W.M., Lee P., White T., and Lee S. Surf. Coat. Tech. 173 (2003) 276
29. Rawat R.S., Zhang T., Thomas Gan K.S., Lee P., and Ramanujan R.R. Appl. Surf. Sci. 253 (2006) 1611
30. Zeb S., et al. Mater. Chem. Phys. 103 (2007) 235
31. Zhang T., Lin J., Patran A., Wong D., Hassan S.M., Mahmood S., White T., Tan T.L., Springham S.V., Lee S., Lee P., and Rawat R.S. Plasma Sources Sci. Technol. 16 (2007) 250
32. Bertalot I., and Herold H. Phys. Lett. A 79 (1980) 389
33. Hassan M., Qayyum A., Ahmad R., Murtaza G., and Zakaullah M. J. Phys. D: Appl. Phys. 40 (2007) 769
34. Katharria Y.S. J. Non-Crystalline Solids 353 (2007) 4660
35. Caruso R.A., and Schattka J.H. Adv. Mater. 12 (2005) 1921
36. Wang Y.J., and Caruso F. Adv. Funct. Mater. 14 (2004) 1012
37. Rawat R.S., Srivastava M.P., Tandon S., and Mansingh A. Phys. Rev. B 47 (1993) 9
38. Lu C.S., Mai Y.W., and Shen Y.G. J. Mater. Sci. 41 (2006) 937