Mitigation of low LER with PAG bonded resist for EUVL

Journal of Photopolymer Science and Technology

Volumn 20, Issue 3, 2007, Pages 419-422

  Fukushima, Yasuyuki ^a   Watanabe, Takeo ^a   Ohnishi, Ryuji ^a   Kinoshita, Hiroo ^a   Shiotani, Hideaki ^a   Suzuki, Shouta ^a   Hayakawa, Masamichi ^b   Endo, Yusuke ^b   Yamanaka, Tomotaka ^b   Yusaa, Shinichi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b TOYO GOSEI CO LTD   (Japan)

Author keywords

EB resist; EUV resist; Line edge roughness; Sensitivity

Indexed keywords

EID: 36148942905     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.419     Document Type: Article

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