Epitaxial growth of Al-Cr-N thin films on MgO(111)

Thin Solid Films

Volumn 517, Issue 2, 2008, Pages 598-602

  Willmann, H ^a,b   Beckers, M ^b   Birch, J ^b   Mayrhofer, P H ^c   Mitterer, C ^c   Hultman, L ^b  

^a MATERIALS CENTER LEOBEN FORSCHUNG GMBH   (Austria)

^b LINKÖPING UNIVERSITY   (Sweden)

^c UNIVERSITY OF LEOBEN   (Austria)

Author keywords

AlCrN; Coherence length; CrAlN; Epitaxy; Mosaicity; Wurtzite structure

Indexed keywords

ALUMINUM; CHROMIUM; COLUMNS (STRUCTURAL); CRYSTAL GROWTH; DIFFRACTION; EPITAXIAL FILMS; FILM GROWTH; KETONES; MAGNETRON SPUTTERING; METALLIC FILMS; MICROSCOPIC EXAMINATION; MOLECULAR BEAM EPITAXY; NITRIDES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THICK FILMS; ZINC SULFIDE;

ALCRN; COHERENCE LENGTH; CRALN; EPITAXY; MOSAICITY; WURTZITE STRUCTURE;

EPITAXIAL GROWTH;

EID: 55149086559     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.07.003     Document Type: Article

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