Formation of Al-Cr-N films by a DC reactive sputtering method and evaluation of their properties

Proceedings of the Second International Conference on Processing Materials for Properties

Volumn , Issue , 2000, Pages 291-296

  Ide, Y ^a   Nakamura, T ^b   Kishitake, K ^c  

^a Yamaguchi Prefectural Industrial Technology Institute   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; COMPOSITION; CRYSTAL STRUCTURE; FRICTION; HIGH TEMPERATURE PROPERTIES; MICROHARDNESS; OXIDATION; SPUTTERING; WEAR OF MATERIALS;

DC REACTIVE SPUTTERING METHOD; ELEVATED TEMPERATURE; FRICTION COEFFICIENT; THERMAL OXIDATION;

NITRIDES;

EID: 0034592525     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)

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