Thermodynamic modeling of Al-Cr-N thin film systems grown by PVD

Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques

Volumn 90, Issue 10, 1999, Pages 847-852

  Kunisch, Clemens ^a   Loos, Roland ^b   Stüber, Michael ^b   Ulrich, Sven ^b  

^a SCHOTT AG   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ELECTRON DIFFRACTION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NITRIDES; SPUTTER DEPOSITION; THERMODYNAMICS; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM CHROMIUM NITRIDE; PHYSICAL VAPOR DEPOSITION (PVD);

PROTECTIVE COATINGS;

EID: 0033204971     PISSN: 00443093     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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