Crystalline, uniform-sized TiO2 nanosphere films by a novel plasma CVD process at atmospheric pressure and room temperature

Chemical Vapor Deposition

Volumn 13, Issue 4, 2007, Pages 141-144

  Zhu, Ai Min ^a   Nie, Long Hui ^a   Wu, Qing Hao ^a   Zhang, Xiu Ling ^a   Yang, Xue Feng ^a   Xu, Yong ^a   Shi, Chuan ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CLIMATOLOGY; ELECTRIC DISCHARGES; METEOROLOGY; NANOCRYSTALLINE ALLOYS; NANOCRYSTALS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; OXIDE MINERALS; PLASMA DEPOSITION; PLASMAS; SURFACE DISCHARGES; TITANIUM DIOXIDE; TITANIUM OXIDES; WATER POLLUTION;

ANATASE FILMS; BANDGAP ENERGIES; CRITICAL LOADS; LATTICE CONFIGURATIONS; LATTICE SPACINGS; PLASMA CHEMICAL VAPOR DEPOSITIONS; PLASMA CVD; ROOM TEMPERATURES; SCANNING ELECTRON MICROSCOPIC; SCRATCH ADHESION TESTS; SIZE AND SHAPES;

CHEMICAL VAPOR DEPOSITION;

EID: 54949123457     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200604230     Document Type: Article

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