Applications of Photoluminescence Techniques to the Characterization of Solid Surfaces in Relation to Adsorption, Catalysis, and Photocatalysis

Advances in Catalysis

Volumn 44, Issue C, 1999, Pages 119-257

  Anpo, Masakazu ^a   Che, Michel ^b  

^a Osaka Prefecture University   (Japan)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

D, dead layer thickness, i.e.; ; ; max; 0; ; symbol ; symbol e; symbol i, symbol ; absolute quenching rate constant; absorption intensity; absorptivity for the emitted light (227); absorptivity for the exciting light (227); chemical vapor deposition; concentrations of the excited state; CVD; diffuse reflectance spectroscopy; DRS; Esg; EA; electron affinity; emission intensity; EXAFS; excited singlet state; excited triplet state; extended X ray absorption fine structure; extinction coefficient; ground singlet state; Ia; Ie; initial and final wave functions respectively; kq; LC; lifetime; low coordination; porous Vycor glass; PVC; quantum efficiency (or yield) of photoluminescence; Rif = symbol i|R| symbol f ; S0; S1; surface band gap; T1; temperature programmed desorption; the change in depletion width; TPD; transition metal ion; transition moment integral; ultraviolet light; UV; wavelength at the maximum intensity of the spectrum; X ray photoelectron spectroscopy; XPS

Indexed keywords

EID: 0000679209     PISSN: 03600564     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S0360-0564(08)60513-1     Document Type: Article

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