Assessment of discharges for large area atmospheric pressure plasma-enhanced chemical vapor deposition (AP PE-CVD)

Thin Solid Films

Volumn 442, Issue 1-2, 2003, Pages 36-39

  Engemann, J ^a   Korzec, D ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Field effect; Glow discharge; Insulators; Plasma processing and deposition

Indexed keywords

ATMOSPHERIC PRESSURE; ELECTRIC INSULATORS; GLOW DISCHARGES; SUBSTRATES;

FIELD EFFECTS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0141539401     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00935-0     Document Type: Conference Paper

References (9)

1. Kanazawa S., Kogoma M., Moriwaki T., Okazaki S. J.: Phys. D: Appl. Phys. 21:1988;838-840.
2. A. Ignatkov, A. Schwabedissen, G.F. Leu, J. Engemann, International Symposium on High Pressure, Low Temperature Plasma Chemistry HAKONE VIII, Pühajärve, Estonia, July 21-25, 2002, paper P1.3.
3. Massines F., Gouda G. J. Phys. D: Appl. Phys. 31:1988;3411-3420.
4. Klages C.-P., Höpfner K., Kläke N., Thyen R. Plasmas Polym. 5:2000;79-89.
5. D. Korzec, E.G. Finantu-Dinu, G.L. Dinu, J. Engemann, M. Štefecka, M. Kando, Eighth International Conference on Plasma Surface Engineering PSE 2002, Garmisch-Partenkirchen, September 9-13, 2002.
6. Štefečka M., Korzec D., Imahori Y., Širý M., Kando M. Sci. Technol. Adv. Mater. 2/3-4:2001;587-593.
7. Korzec D., Finantu-Dinu E.G., Schwabedissen A., Engemann J., RáheI' J., Štefečka M., Imahori Y., Kando M. Surf. Coat. Technol. 169-170C:2003;230-234.
8. M. Štefecka,̄ M. Kando, M. Cernák, D. Korzec, E.G. Finantu-Dinu, G.L. Dinu, J. Engemann, Eight International Conference on Plasma Surface Engineering PSE 2002, Garmisch-Partenkirchen, September 9-13, 2002.
9. German Patent 'Vorrichtung zur Erzeugung eines APG-Plasmas' (January 2002, pending).