Light-induced CVD of titanium dioxide thin films II: Thin film crystallinity

Chemical Vapor Deposition

Volumn 11, Issue 1, 2005, Pages 29-37

  Halary Wagner, Estelle ^a   Wagner, Frank R ^a   Brioude, Arnaud ^a   Mugnier, Jacques ^b   Hoffmann, Patrik ^a  

^a EPFL   (Switzerland)

^b UNIVERSITÉ LYON 1   (France)

Author keywords

Anatase; Excimer laser; Rutile; Titanium dioxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; COMPUTER SIMULATION; EXCIMER LASERS; LIGHT SOURCES; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

ANATASE; DEPOSITION PARAMETERS; DEPOSITION REACTIONS; SUBSTRATE TEMPERATURES;

METALLIC FILMS;

EID: 13844255804     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306304     Document Type: Article

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