SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 1036-1040

Plasma enhanced CVD deposition of titanium oxide for biomedical applications

(5) Szymanowski, H a Sobczyk, A a Gazicki Lipman, M a Jakubowski, W a Klimek, L a

a LODZ UNIVERSITY OF TECHNOLOGY (Poland)

Author keywords

Escherichia coli; PECVD; Photocatalyst; TiO2

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; ESCHERICHIA COLI; GLASS; MEDICAL APPLICATIONS; OXYGEN; PHOTOCATALYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; TEXTILES; THIN FILMS; ULTRAVIOLET RADIATION;

BIOMEDICAL APPLICATIONS; TITANIUM OXIDE FILMS;

TITANIUM DIOXIDE;

COATING;

EID: 24644435406 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.01.092 Document Type: Article

Times cited : (77)

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