Atom and ion chemistry in low pressure hydrogen DC plasmas

Journal of Physical Chemistry A

Volumn 110, Issue 18, 2006, Pages 6060-6066

  Mendez I ^a   Gordillo Vazquez F J ^b   Herrero, V J ^a   Tanarro, I ^a  

^a INSTITUTO DE ESTRUCTURA DE LA MATERIA   (Spain)

^b INSTITUTO DE ÓPTICA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; COMPOSITION; IONIZATION; MASS SPECTROMETRY; MATHEMATICAL MODELS; OPTICAL PROPERTIES;

DC PLASMAS; ION CHEMISTRY; KINETIC MODEL;

PLASMAS;

EID: 33744831155     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp057182+     Document Type: Article

References (55)

1. Herbst, E.; Klemperer, W. Astrophys. J. 1973, 185, 505.
2. Watson, W. D. Astrophys. J. 1973, 183, L17.
3. Oka, T. Phys. Rev. Lett. 1980, 45, 531.
4. McCall, B. J.; Oka, T. Science 2000, 287, 1941.
5. Petrović, Z. L.; Jelenović, B. M.; Phelps, A. V. Phys. Rev. Lett. 1992, 68, 325.
6. St-Onge, L.; Moisan, M. Plasma Chem. Plasma Proc. 1994, 2, 87.
7. Gicquel, A.; Chenevier, M.; Hassouni, K.; Tserepi, A.; Dubus, M. Appl. Phys. 1998, 83, 7504.
8. von Keudell, A.; Jacob, W. Prog. Surf. Sci. 2004,.
9. Gorse, C.; Capitelli, M.; Bacal, M.; Bretagne, J.; Lagana, A. Chem. Phys. 1987, 117, 177.
10. Loureiro, J.; Ferreira, C. M. J. Phys. D: Appl. Phys. 1989, 22, 1680.
11. Gorse, C.; Celiberto, R.; Cacciatore, R.; Lagana, M.; Capitelli, M. Chem. Phys. 1992, 161, 211.
12. Garscadden, A.; Nagpal, R. Plasma Sources Sci. Technol. 1995, 4, 268.
13. Matveyev, A. A.; Silakov, V. P. Plasma Sources Sci. Technol. 1995, 4, 268.
14. Hassouni, K.; Gicquel, A.; Capitelli, M.; Loureiro, J. Plasma Sources, Sci. Technol. 1999, 8, 494.
15. Capitelli, M.; Celiberto, R.; Gorse, C.; Laricchiuta, A.; Pagano, D.; Traversa, P. Phys. Rev. E 2004, 69, Art. No. 023504, Part 2.
16. Laricchiuta, A.; Celiberto, R.; Janev, R. K. Phys. Rev. A 2004, 69, Art No. 022706.
17. Shakhatov, V. A.; De Pascale, O.; Capitelli, M.; Hassouni, K.; Lombardi, G.; Gicquel, A. Phys. Plasmas 2005, 12, Art. No. 023504.
18. Hassouni, K.; Lombardi, G,; Gicquel, A.; Capitelli, M.; Shakhatov, V. A.; De Pascale O. Phys. Plasmas 2005, 12, Art. No. 073301.
19. Bacal, M.; Hamilton, G. W. Phys. Rev. Lett. 1979, 42, 1538.
20. Kalache, B.; Novikova, T.; Fontcuberta i Morral, A.; Roca i Cabarrocas, P.; Morscheidt, W.; Hassouni, K. J. Phys. D: Appl. Phys. 2004, 37, 1765.
21. Diomede, P.; Longo, S.; Capitelli, M. Eur. Phys. J. D. 2005, 33, 243.
22. Tawara, H.; Itikawa, Y.; Nishimura, H.; Yoshino, M. J. Phys. Chem. Ref. Data. 1990, 19, 617.
23. Phelps, A. V. J. Phys. Chem. Ref. Data. 1990, 19, 653.
24. Celiberto, R.; Janev, R. K.; Laricchiuta, A.; Capitelli, M.; Wadhera, M.; Atems, D. E. At Data Nucl. Data Tables 2001, 77, 161.
25. Celiberto, R.; Capitelli, M.; Laricchiuta, A. Ohys. Scr. 2002, T96, 32.
26. Capitelli, M.; Celiberto, R.; Esposito, F.; Laricchiuta, A.; Hassouni, K.; Longo, S. Plasma Sources Sci. Technol. 2002, 11, A7.
27. Pigarov, A. Yu. Phys. Scr. 2002, T96, 16.
28. Albella, J. M.; Gomez-Aleixandre, C.; Sánchez-Garrido, O.; Vázquez, L.; Martínez-Duart, J. Surf. Coat. Technol. 1995, 70, 163.
29. Lee, S. T.; Lin, Z.; Jiang, X. Mater. Sci. Eng. 1999, 25, 123.
30. Marinkovic, S. N. Chem. Phys. Carbon 2004, 29, 71.
31. Hollmann, E. M.; Pigarov, A. Yu. Phys. Plasmas 2002, 9, 4330. Numerical values for the rate coefficients used in this work were kindly provided by E. M. Hollmann to the authors.
32. Hollmann, E. M.; Antat, G.; Doerner, R. P.; Luckhardt, S. C. Rev. Sci. Instrum. 2001, 72, 623.
33. Geobel, D. M.; Campbell, G.; Conn, R. W. J. Nucl. Mater. 1984, 121, 27.
34. Castillo, M.; Méndez, I.; Islyaikin, A. M.; Herrero, V. J.; Tanarro, I. J. Phys. Chem. A 2005, 109, 6225.
35. Tabarés, F. L.; Tafalla, D.; Tanarro, I.; Herrero, V. J.; Islyaikin, A. M. Vacuum 2004, 73, 161.
36. Tabarés, F. L.; Tafalla, D.; Tanarro, I.; Herrero, V. J.; Islyaikin, A.; Maffiotte, C. Plasma Phys. Controlled Fusion 2002, 44, L37.
37. De los Arcos, T.; Domingo, Domingo, C; Herrero, V. J.; Sanz, M. M.; Schultz, A.; Tanarro, I. J. Phys. Chem. A 1998, 102, 6282.
38. Laframboise, J. G. Report No. 100. Institute of Aerospace Studies, University of Toronto: Toronto, Canada, 1966.
39. Allen, J. E. Plasma Sources Sci. Technol. 1995, 4, 234.
40. Schott, L. Electrical Probes in Plasma Diagnostics, Lochte-Holtgreven, W., Ed.: American Institute of Physics: New Yok 1995.
41. Eight Peak Index of Mass Spectra; 4th ed.; Mass Spectrometry Data Centre, Royal Society of Chemistry: Cambridge, U.K., 1991.
42. Lavrov, B. P.; Melnikov, A. S.; Käning, M.; Röpcke, J. Phys. Rev. E 1999, 59, 3526.
43. Qing, Z.; Otorbaev, D. K.; Brussaard, G. J. H.; van de Sanden, M. C. M. J. Appl. Phys. 1996, 80, 1312.
44. Lavrov, B. P.; Osiac, M.; Pipa, A. V.; Röpcke, J. Plasma Sources Sci. Technol. 2003, 12, 576.
45. Lavrov, B. P.; Pipa, A. V. At. Spectrosc. 2002, 92, 709.
46. Pipa A V, Ph.D. Thesis. On Determination of the Degree of Dissociation of Hydrogen in Non-Equilibrium Plasmas by Means of Emission Spectroscopy. Greifswald, Germany, 2004.
47. Laborie, P.; Rocard, J. M.; Rees, J. A. Tables de Sections Efficaces Électroniques et Coefficients Macroscopiques I Hydrogène et Gaz Rares; Paris, Dunod: Paris, 1968.
48. Anicich, V. G. J. Phys. Chem. Ref. Data. 1993, 22, 1469.
49. Datz, S.; Sundström, G.; Biedermann, Ch.; Broström L.; Danared, H.; Mannervik, S.; Mowat, J. R.; Larsson, M. Phys. Rev. Lett. 1995, 74, 896.
50. Chantry, P. J. J. Appl. Phys. 1987, 62, 220.
51. Lieberman, M. A.; Lichtenberg, A. J. Principles of Plasma Discharges and Materials Processing; John Wiley & Sons: New York, 1994.
52. Tserepi, A. D.; Miller, T. A. J. Appl. Phys. 1994, 75, 7231.
53. Kae-Nune, P.; Perrin, Jerôme, Jolly, J, Guillon, J. Surf. Sci. Lett. 1996, L495.
54. Larson, M. Annu. Rev. Phys. Chem. 1997, 48, 151.
55. Macko, P.; Ban, G.; Hlavenka, P.; Plasil, R.; Poterya, V.; Pysanenko, A.; Votava, O.; Johnsen, R.; Glosik, J. Int. J. Mass. Spectrosc. 2004, 233, 299.