A close proximity self-aligned shadow mask for sputter deposition onto a membrane or cavity

Journal of Micromechanics and Microengineering

Volumn 18, Issue 9, 2008, Pages

  Kummamuru, Ravi K ^a,b   Hu, Liang ^a   Cook, Lawrence ^b   Efremov, Mikhail Y ^a   Olson, Eric A ^a   Allen, Leslie H ^a,b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 54749084186     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/9/095027     Document Type: Article

References (20)

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