SCOPUS 정보 검색 플랫폼

Journal of Micromechanics and Microengineering

Volumn 6, Issue 2, 1996, Pages 279-284

Precise mask alignment to the crystallographic orientation of silicon wafers using wet anisotropic etching

(2) Vangbo, Mattias a Bäcklund, Ylva a

a UPPSALA UNIVERSITY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; COMPOSITE MICROMECHANICS; CRYSTAL ORIENTATION; ETCHING; MASKS; POTASSIUM COMPOUNDS; SILICON WAFERS; SOLUTIONS;

CRYSTALLOGRAPHIC ORIENTATION; ETCHANTS; ETHYLENEDIAMINE SOLUTIONS; ISOPROPYL ALCOHOL; MASK ALIGNMENT; TETRAMETHYL AMMONIUM HYDROXIDE; WET ANISOTROPIC ETCHING;

MICROELECTRONIC PROCESSING;

EID: 0030156411 PISSN: 09601317 EISSN: None Source Type: Journal
DOI: 10.1088/0960-1317/6/2/011 Document Type: Article

Times cited : (87)

References (9)

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- Bassous, E.¹

2
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5
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- Elwenspoek, M.¹

7
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8
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.