SCOPUS 정보 검색 플랫폼

Journal of Micromechanics and Microengineering

Volumn 6, Issue 2, 1996, Pages 279-284

Precise mask alignment to the crystallographic orientation of silicon wafers using wet anisotropic etching

(2) Vangbo, Mattias a Bäcklund, Ylva a

a UPPSALA UNIVERSITY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; COMPOSITE MICROMECHANICS; CRYSTAL ORIENTATION; ETCHING; MASKS; POTASSIUM COMPOUNDS; SILICON WAFERS; SOLUTIONS;

CRYSTALLOGRAPHIC ORIENTATION; ETCHANTS; ETHYLENEDIAMINE SOLUTIONS; ISOPROPYL ALCOHOL; MASK ALIGNMENT; TETRAMETHYL AMMONIUM HYDROXIDE; WET ANISOTROPIC ETCHING;

MICROELECTRONIC PROCESSING;

EID: 0030156411 PISSN: 09601317 EISSN: None Source Type: Journal
DOI: 10.1088/0960-1317/6/2/011 Document Type: Article

Times cited : (86)

References (9)

1
- 0018030083
- Fabrication of novel three-dimensional microstructures by anisotropic etching of (100) and (110) silicon
- Bassous E 1978 Fabrication of novel three-dimensional microstructures by anisotropic etching of (100) and (110) silicon IEEE Trans. Electron Devices ED-25 1178-85
- (1978) IEEE Trans. Electron Devices , vol.ED-25 , pp. 1178-1185
- Bassous, E.¹

2
- 0028407612
- Micromachined optical planes and reflectors in silicon
- Rosengren L, Smith L and Bäcklund Y 1994 Micromachined optical planes and reflectors in silicon Sensors Actuators A 41&42 330-3
- (1994) Sensors Actuators A , vol.41-42 , pp. 330-333
- Rosengren, L.¹ Smith, L.² Bäcklund, Y.³

3
- 0028014977
- Micro-opto-mechanical devices fabricated by anisotropic etching of (110) silicon
- Uenishi Y, Tsugai M and Mehregany M 1995 Micro-opto-mechanical devices fabricated by anisotropic etching of (110) silicon Proc. IEEE Micro Electro Mechanical Systems 1995 (Amsterdam) pp 319-24
- (1995) Proc. IEEE Micro Electro Mechanical Systems 1995 (Amsterdam) , pp. 319-324
- Uenishi, Y.¹ Tsugai, M.² Mehregany, M.³

4
- 0029256760
- Silicon wafer integrated enzyme reactors
- Laurell T, Drott J and Rosengren L 1995 Silicon wafer integrated enzyme reactors Biosensors Bioelectron. 10 289-99
- (1995) Biosensors Bioelectron. , vol.10 , pp. 289-299
- Laurell, T.¹ Drott, J.² Rosengren, L.³

5
- 0029489892
- Alignment of mask patterns to crystal orientation
- Ensell G 1995 Alignment of mask patterns to crystal orientation Proc. 8th Int. Conf. on Solid-State Sensors and Actuators and Eurosensors IX (Stockholm) vol 1, pp 186-9
- (1995) Proc. 8th Int. Conf. on Solid-State Sensors and Actuators and Eurosensors IX (Stockholm) , vol.1 , pp. 186-189
- Ensell, G.¹

6
- 0029424484
- Physical chemistry of wet chemical anisotropic etching of silicon
- Elwenspoek M 1995 Physical chemistry of wet chemical anisotropic etching of silicon Proc. ASME Dynamic Systems and Control Division vol 2, DSC-Vol 57-2, pp 901-8
- (1995) Proc. ASME Dynamic Systems and Control Division , vol.2-57 DSC , Issue.2 , pp. 901-908
- Elwenspoek, M.¹

7
- 0030091411
- Terracing of (100)-Si with one mask and one etching step using misaligned V-grooves
- Vangbo M and Bäcklund Y 1996 Terracing of (100)-Si with one mask and one etching step using misaligned V-grooves J. Micromech. Microeng. 6 39-41
- (1996) J. Micromech. Microeng. , vol.6 , pp. 39-41
- Vangbo, M.¹ Bäcklund, Y.²

8
- 0025521074
- Anisotropic etching of crystalline silicon in alkaline solutions
- Seidel H, Csepregi L, Heuberger A and Baumgärtel H 1990 Anisotropic etching of crystalline silicon in alkaline solutions J. Electrochem. Soc. 137 3612-25
- (1990) J. Electrochem. Soc. , vol.137 , pp. 3612-3625
- Seidel, H.¹ Csepregi, L.² Heuberger, A.³ Baumgärtel, H.⁴

9
- 4243157224
- High-index-plane etch rate and micromachining of power devices
- Linder S and Baltes H 1990 High-index-plane etch rate and micromachining of power devices 1990 Tech. Dig. 2nd Workshop on Micromachining, Micromechanics and Microsystems (Berlin) pp 25-30
- (1990) 1990 Tech. Dig. 2nd Workshop on Micromachining, Micromechanics and Microsystems (Berlin) , pp. 25-30
- Linder, S.¹ Baltes, H.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.