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Volumn 6, Issue 2, 1996, Pages 279-284
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Precise mask alignment to the crystallographic orientation of silicon wafers using wet anisotropic etching
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Author keywords
[No Author keywords available]
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Indexed keywords
ALCOHOLS;
COMPOSITE MICROMECHANICS;
CRYSTAL ORIENTATION;
ETCHING;
MASKS;
POTASSIUM COMPOUNDS;
SILICON WAFERS;
SOLUTIONS;
CRYSTALLOGRAPHIC ORIENTATION;
ETCHANTS;
ETHYLENEDIAMINE SOLUTIONS;
ISOPROPYL ALCOHOL;
MASK ALIGNMENT;
TETRAMETHYL AMMONIUM HYDROXIDE;
WET ANISOTROPIC ETCHING;
MICROELECTRONIC PROCESSING;
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EID: 0030156411
PISSN: 09601317
EISSN: None
Source Type: Journal
DOI: 10.1088/0960-1317/6/2/011 Document Type: Article |
Times cited : (86)
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References (9)
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