A new approach to convex corner compensation for anisotropic etching of (100) Si in KOH

Sensors and Actuators, A: Physical

Volumn 56, Issue 3, 1996, Pages 251-254

  Zhang, Qingxin ^a   Liu, Litian ^a   Li, Zhijian ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Anisotropic etching; Convex corner compensation; Convex corner structure

Indexed keywords

ANISOTROPY; CRYSTAL ORIENTATION; ETCHING; MICROMACHINING; POTASSIUM COMPOUNDS; THREE DIMENSIONAL;

CONVEX CORNER COMPENSATION METHOD; POTASSIUM HYDROXIDE; SILICON MICROMACHINING;

SILICON SENSORS;

EID: 0030233675     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(96)01312-X     Document Type: Article

References (4)

1. B. Puers and W. Sansen, Compensation structures for convex corner micromachining in (100) silicon, Sensors and Actuators, A21-A23 (1990) 1036-1042.
2. M. Bao, Chr. Burrer, J. Esteve, J. Bausells and S. Marco, Etching front control of 〈100〉 strips for corner compensation, Sensors and Actuators A, 37-38 (1993) 727-732.
3. G.K. Mayer, H.L. Offereins, H. Sandmaier and K. Kũhl, Fabrication of non-underetched convex corners in anisotropic etching of (100)-silicon in aqueous KOH with respect to novel micromechanic elements, J. Electrochem. Soc., 137 (1990) 3947-3951.
4. H. Sandmaier, H.L. Offereins, K. Kũhl and W. Lang, Corner compensation techniques in anisotropic etching of (100)-silicon using aqueous KOH, Tech. Digest, 7th Int. Conf. Solid-State Sensors and Actuators (Transducers '91), San Francisco, CA, USA, 24-28 June, 1991, pp. 456-459.