A novel process for perfect convex corner realization in bulk micromachining

Journal of Micromechanics and Microengineering

Volumn 14, Issue 10, 2004, Pages 1416-1420

  Pal, Prem ^a   Chandra, Sudhir ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; PHOTORESISTS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON NITRIDE; SILICON WAFERS; SURFACE TENSION;

ANISOTROPIC ETCHING; ETCH RATE; LOCAL OXIDATION OF SILICON (LOCOS); OXIDE ETCHING;

MICROMACHINING;

EID: 7044233344     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/14/10/018     Document Type: Article

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