Interference of surface plasmon waves and plasmon coupled waveguide modes for the patterning of thin film

IEEE Journal of Quantum Electronics

Volumn 44, Issue 4, 2008, Pages 305-311

  Lim, Yongjun ^a   Kim, Seyoon ^a,b,c   Kim, Hwi ^a   Jung, Jaehoon ^d   Lee, Byoungho ^a  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

^c Agency for Defence Development   (South Korea)

^d Dankook University   (South Korea)

Author keywords

Optical lithography; Plasmon coupled waveguide mode; Surface plasmon resonance; Thin film patterning

Indexed keywords

ATTENUATED TOTAL REFLECTIONS; DIELECTRIC LAYERS; GOLD LAYERS; OPTICAL LITHOGRAPHY; PHOTOSENSITIVE LAYERS; STRATIFIED MEDIAS; SURFACE PLASMON MODES; SURFACE PLASMON WAVES; THIN-FILM PATTERNING;

ELECTROMAGNETIC FIELDS; PHOTOLITHOGRAPHY; SURFACE PLASMON RESONANCE; THIN FILM DEVICES; TRANSFER MATRIX METHOD; WAVEGUIDES;

PLASMONS;

EID: 54249149212     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/JQE.2007.912462     Document Type: Article

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