UV-laser-assisted degradation of poly(methyl methacrylate)

Polymer Degradation and Stability

Volumn 89, Issue 2, 2005, Pages 252-264

  Wochnowski, C ^a   Eldin, M A Shams ^b   Metev, S ^a  

^a BIAS BREMER INSTITUT FÜR ANGEWANDTE STRAHLTECHNIK GMBH   (Germany)

^b MANSOURA UNIVERSITY   (Egypt)

Author keywords

Norrish reaction; Poly(methyl methacrylate); Refractive index modification; UV excimer laser; X ray photoelectron spectroscopy (XPS)

Indexed keywords

DEGRADATION; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR STRUCTURE; NUCLEAR MAGNETIC RESONANCE; POLYMERS; REACTION KINETICS; REFRACTIVE INDEX; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

NORRISH REACTION; REFRACTIVE INDEX MODIFICATION; UV-EXCIMER LASERS; WAVELENGTH;

POLYMETHYL METHACRYLATES;

EID: 18144385116     PISSN: 01413910     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymdegradstab.2004.11.024     Document Type: Article

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