Dynamic blanking control of single column multi-electron-beam system

Physics Procedia

Volumn 1, Issue 1, 2008, Pages 545-552

  Kamimura, Osamu ^a   Ohta, Hiroya ^a   Tanimoto, Sayaka ^a   Sakakibara, Makoto ^a   Nakayama, Yoshinori ^a   Sohda, Yasunari ^a   Muraki, Masato ^b   Gotoh, Susumu ^b   Hosoda, Masaki ^b   Someda, Yasuhiro ^b   Tamamori, Kenji ^b   Hirose, Futoshi ^b   Nagae, Kenichi ^b   Kato, Kazuhiko ^b   Seto, Isamu ^b   Kuwabara, Masamichi ^b   Okunuki, Masahiko ^b  

^a HITACHI LTD   (Japan)

^b CANON INC   (Japan)

Author keywords

Electron beam; Inspection; Lithography; Micro electro mechanical system (MEMS) technology; Multi beam system; Single column

Indexed keywords

EID: 54149119397     PISSN: 18753884     EISSN: 18753892     Source Type: Conference Proceeding    
DOI: 10.1016/j.phpro.2008.07.137     Document Type: Conference Paper

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