Ex situ variable angle spectroscopic ellipsometry studies on chemical vapor deposited boron-doped diamond films: Layered structure and modeling aspects

Journal of Applied Physics

Volumn 104, Issue 7, 2008, Pages

  Gupta, S ^a   Dudipala, A ^a   Williams, O A ^b   Haenen, K ^b   Bohannan, E ^c  

^a University of Missouri   (United States)

^b HASSELT UNIVERSITY   (Belgium)

^c MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; BORON; CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); DIAMONDS; ELLIPSOMETRY; FILM PREPARATION; FRICTION; HYDROGEN; METAL ANALYSIS; METHANE; MICROSCOPIC EXAMINATION; MICROWAVES; MODEL STRUCTURES; MULTILAYER FILMS; NONMETALS; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; PLASMA DEPOSITION; REGRESSION ANALYSIS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SPECTROSCOPIC ELLIPSOMETRY; SPONTANEOUS EMISSION; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACE STRUCTURE; THICK FILMS; VAPORS;

AND MODELING; ANGLE SPECTROSCOPIC ELLIPSOMETRIES; APPROPRIATE MODELS; ATOMIC FORCES; BDD FILMS; BORON CONCENTRATIONS; BRUGGEMAN EFFECTIVE MEDIUM APPROXIMATIONS; CHEMICAL VAPOR DEPOSITED; COMPONENT LAYERS; DOPED DIAMONDS; EX-SITU; GROWTH AXES; HYDROGEN DILUTIONS; INHOMOGENEITY; INTERFACIAL LAYERS; LAYERED MODELS; LAYERED STRUCTURES; LINEAR REGRESSION ANALYSIS; LINEAR RELATIONSHIPS; MICROWAVE PLASMAS; MODEL FITTEST; MODELING; NEAR-IR; OPTICAL WAVELENGTHS; PSEUDODIELECTRIC FUNCTIONS; ROTATING ANALYZERS; ROUGHNESS LAYERS; SI(100); SQUARED ERRORS; STRUCTURAL MODELS; SUBSTRATE TEMPERATURES; SURFACE LAYERS; THIN-FILMS; TOP SURFACES; TRIMETHYLBORON;

DIAMOND FILMS;

EID: 54049140908     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2990058     Document Type: Article

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