Analysis of the growth processes of plasma-enhanced chemical vapor deposited diamond films from CO/H2 and CH4/H2 mixtures using real-time spectroellipsometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 4, 1997, Pages 1929-1936

  Lee, Joungchel ^a,c   Collins, R W ^a,c   Hong, Byungyou ^a   Messier, R ^a,c   Strausser, Y E ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b Digital Instruments   (United States)

^c Department of Physics ^*

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031499108     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580661     Document Type: Article

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