Ferroelectric properties, morphologies, and leakage currents of Bi 0.97La0.03FeO3 thin films deposited on indium tin oxide/glass substrates

Journal of Applied Physics

Volumn 104, Issue 7, 2008, Pages

  Yan, J ^a   Hu, G D ^a   Chen, X M ^a   Wu, W B ^a   Yang, C H ^a  

^a UNIVERSITY OF JINAN   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL GROWTH; DECOMPOSITION; FERROELECTRICITY; GRAIN BOUNDARIES; HYSTERESIS; HYSTERESIS LOOPS; INDIUM; IRON OXIDES; LANTHANUM; MAGNETIC MATERIALS; ORGANOMETALLICS; OXIDE FILMS; THICK FILMS; THIN FILMS; TIN; TITANIUM COMPOUNDS;

ANNEALING TEMPERATURES; DOMINANT FACTORS; FERROELECTRIC PROPERTIES; GLASS SUBSTRATES; INDIUM-TIN-OXIDE; METAL ORGANIC; MORPHO-LOGIES; RELATIVE INTENSITIES; REMANENT POLARIZATIONS;

LEAKAGE CURRENTS;

EID: 54049100369     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2975321     Document Type: Article

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