Ferroelectric characteristics of BiFeO3 thin films prepared via a simple chemical solution deposition

Journal of Applied Physics

Volumn 101, Issue 7, 2007, Pages

  Simoes A Z ^a   Gonzalez, A H M ^a   Cavalcante, L S ^b   Riccardi, C S ^c   Longo, E ^a   Varela, J A ^a  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^b FEDERAL UNIVERSITY OF SÃO CARLOS   (Brazil)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SOLUTION DEPOSITION; ELECTRIC FIELD CURVES; LEAKAGE CURRENT DENSITY; POLYMERIC PRECURSORS;

ANNEALING; CRYSTALLIZATION; DEPOSITION; LEAKAGE CURRENTS; OXIDATION; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROELECTRIC THIN FILMS;

EID: 34247273022     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2715513     Document Type: Article

References (16)

1. M. Fiebig, J. Phys. D 38, R132 (2005).
2. S. M. Skinner, IEEE Trans. Parts Mater. Pack. 6, 68 (1970).
3. F. Kubel and H. Schmid, Acta Crystallogr., Sect. B: Struct. Sci. 46, 698 (1990).
4. C. Michel, J.-M. Moreau, G. D. Achenbechi, R. Gerson, and W. J. James, Solid State Commun. 7, 701 (1969).
5. J. M. Moreau, C. Michel, R. Gerson, and W. J. James, J. Phys. Chem. Solids 32, 1315 (1971).
6. S. Y. Yang, F. Zavaliche, Y. H. Chu, Y. J. Lee, L. Mohaddes-Ardabili, T. Zhao, Q. Zhan, and R. Ramesh, APS March Meeting, 2005, p. 21.
7. S. V. Kiselev, R. P. Ozerov, and G. S. Zhdanov, Sov. Phys. Dokl. 7, 742 (1963).
8. V. R. Palkar, J. John, and R. Pinto, Appl. Phys. Lett. 80, 1628 (2002).
9. J. Wang et al., Science 299, 1719 (2003).
10. K. Y. Yun, M. Noda, and M. Okuyama, Appl. Phys. Lett. 83, 3981 (2003).
11. K. Y. Yun, D. Ricinschi, T. Kanashima, M. Noda, and M. Okuyama, Jpn. J. Appl. Phys., Part 2 43, L647 (2004).
12. Y. P. Wang, L. Zhou, M. F. Zhang, X. Y. Chen, J. M. Liu, and Z. G. Liu, Appl. Phys. Lett. 84, 1731 (2004).
13. A. Z. Simões, M. A. Ramírez, A. Ries, E. Longo, J. A. Varela, and R. Ramesh, Appl. Phys. Lett. 88, 072916 (2006).
14. W. M. Zhu and Z.-G. Ye, Ceram. Int. 30, 1435 (2004).
15. H. Uchida, R. Ueno, H. Nakaki, H. Funakubo, and S. Koda, Jpn. J. Appl. Phys., Part 244, L561 (2005).
16. X. Qi, J. Dho, R. Tomov, M. G. Blamire, and J. L. MacManus-Driscoll, Appl. Phys. Lett. 86, 062903 (2005).