Ferroelectric fatigue endurance of Bi4-x Lax Ti3 O12 thin films explained in terms of x-ray photoelectron spectroscopy

Journal of Applied Physics

Volumn 101, Issue 8, 2007, Pages

  Simoes A Z ^a   Riccardi, C S ^a   Cavalcante, L S ^a   Longo, E ^a   Varela, J A ^a   Mizaikoff, B ^b   Hess, D W ^b  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT PAIRS; FATIGUE ENDURANCE; METAL OXYGEN OCTAHEDRAL;

BISMUTH COMPOUNDS; CAPACITORS; FATIGUE OF MATERIALS; FERROELECTRIC MATERIALS; OXYGEN VACANCIES; POLYCRYSTALLINE MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 34247874617     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2719013     Document Type: Conference Paper

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