Soft chemical deposition of BiFeO3 multiferroic thin films

Applied Physics Letters

Volumn 90, Issue 5, 2007, Pages

  Gonzalez, A H M ^a   Simoes A Z ^a   Cavalcante, L S ^a   Longo, E ^a   Varela, J A ^a   Riccardi, C S ^b  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LEAKAGE CONDUCTION; PIEZOELECTRIC COEFFICIENT; PULSED POLARIZATION; QUASISTATIC HYSTERESIS;

ANNEALING; BISMUTH COMPOUNDS; CRYSTALLINE MATERIALS; DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; FERROELECTRICITY; MAGNETIC HYSTERESIS; TITANIUM COMPOUNDS;

THIN FILMS;

EID: 33846998273     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2433027     Document Type: Article

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