메뉴 건너뛰기




Volumn , Issue , 2007, Pages 1179-1184

Advances in nanoimprint lithography

Author keywords

Isothermal imprint; Nanofabrication; Nanoimprint lithography; Room temperature nanoimprint lithography

Indexed keywords

ELECTRONICS ENGINEERING; NANOTECHNOLOGY; PAINTING; TECHNOLOGY;

EID: 52949154341     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2007.4601394     Document Type: Conference Paper
Times cited : (12)

References (18)
  • 1
    • 0142037327 scopus 로고
    • Imprint of sub-25 nm vias and trenches in polymers
    • S. Y. Chou, "Imprint of sub-25 nm vias and trenches in polymers," Appl. Phys. Lett., vol 67, pp. 3114-3116, 1995.
    • (1995) Appl. Phys. Lett , vol.67 , pp. 3114-3116
    • Chou, S.Y.1
  • 2
    • 0030570065 scopus 로고    scopus 로고
    • Imprint lithography with 25-nanometer resolution
    • S. Y. Chou, P. R. Krauss, and P. J. Renstrom, "Imprint lithography with 25-nanometer resolution," Science, vol. 272, pp. 85-87, 1996.
    • (1996) Science , vol.272 , pp. 85-87
    • Chou, S.Y.1    Krauss, P.R.2    Renstrom, P.J.3
  • 4
    • 44049088060 scopus 로고    scopus 로고
    • H.-C. Scheer, H. Schulz, T. Hoffmann, C. M. Sotomayor Torres, and H. S. Nalwa Ed, New York, USA: Academic Press
    • H.-C. Scheer, H. Schulz, T. Hoffmann, C. M. Sotomayor Torres, and H. S. Nalwa (Ed.), Handbook of Thin Film Materials, New York, USA: Academic Press, vol. 5, pp. 1-60, 2002.
    • (2002) Handbook of Thin Film Materials , vol.5 , pp. 1-60
  • 6
  • 7
    • 0032625408 scopus 로고    scopus 로고
    • M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, Step and flash imprint lithography: a new approach to high-resolution patterning, in Proc. SPIE Conference on Emerging Lithographic Technologies III, 1999, 3676, pp. 379-389.
    • M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, "Step and flash imprint lithography: a new approach to high-resolution patterning," in Proc. SPIE Conference on Emerging Lithographic Technologies III, 1999, vol. 3676, pp. 379-389.
  • 8
    • 5344268855 scopus 로고    scopus 로고
    • Mold-assisted nanolithography: A process for reliable pattern replication
    • J. Haisma, M. Verheijen, K. Van der Huevel, and J. Van den Berg, "Mold-assisted nanolithography: a process for reliable pattern replication," J. Vac. Sci. Technol. B., vol. 14 (6), pp. 4124-4129, 1996.
    • (1996) J. Vac. Sci. Technol. B , vol.14 , Issue.6 , pp. 4124-4129
    • Haisma, J.1    Verheijen, M.2    Van der Huevel, K.3    Van den Berg, J.4
  • 9
    • 33746626110 scopus 로고    scopus 로고
    • Ultraviolet-nanoimprint of 40 nm scale patterns using functionality modified fluorinated hybrid materials
    • W. S. Kim, D. G. Choi, and B. S. Bae, "Ultraviolet-nanoimprint of 40 nm scale patterns using functionality modified fluorinated hybrid materials," Nanotechnology, vol. 17 (13), pp. 3319-3324, 2006.
    • (2006) Nanotechnology , vol.17 , Issue.13 , pp. 3319-3324
    • Kim, W.S.1    Choi, D.G.2    Bae, B.S.3
  • 10
    • 70349902988 scopus 로고    scopus 로고
    • F. Brunetti, S. Harrer, G. Scarpa, P. Lugli, M. Kubenz, C. Schuster, and F. Reuther, Pattern transfer process using innovative polymers in combined thermal and UV nanoimprint lithography (TUV-NIL), in Proc. MRS Spring Meeting 2007, San Francisco, 2007, accepted for publication.
    • F. Brunetti, S. Harrer, G. Scarpa, P. Lugli, M. Kubenz, C. Schuster, and F. Reuther, "Pattern transfer process using innovative polymers in combined thermal and UV nanoimprint lithography (TUV-NIL)," in Proc. MRS Spring Meeting 2007, San Francisco, 2007, accepted for publication.
  • 11
    • 35048903120 scopus 로고    scopus 로고
    • C. Schuster, M. Kubenz, F. Reuther, M. Fink, and G. Gruetzner, mr-NIL 6000 - New epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography, in Proc. SPIE Conference on Emerging Technologies XI, San Jose, 2007, 6517, pp. 65172B-1-65172B-11.
    • C. Schuster, M. Kubenz, F. Reuther, M. Fink, and G. Gruetzner, "mr-NIL 6000 - New epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography," in Proc. SPIE Conference on Emerging Technologies XI, San Jose, 2007, vol. 6517, pp. 65172B-1-65172B-11.
  • 12
    • 21144432461 scopus 로고    scopus 로고
    • 6 nm half-pitch lines and 0.04 μm2 static random access memory patterns by nanoimprint lithography
    • M. D. Austin, W. Zhang, H. Ge, D. Wassermann, S. Y. Lyon, S. Y. Chou, "6 nm half-pitch lines and 0.04 μm2 static random access memory patterns by nanoimprint lithography," Nanotechnology, vol. 16, pp. 1058-1061, 2005.
    • (2005) Nanotechnology , vol.16 , pp. 1058-1061
    • Austin, M.D.1    Zhang, W.2    Ge, H.3    Wassermann, D.4    Lyon, S.Y.5    Chou, S.Y.6
  • 13
    • 1642360534 scopus 로고    scopus 로고
    • Nanoscale patterning for the formation of extensive wires,
    • US Patent No Specification 6407443 B2, 2002
    • Y. Chen, and R. S. Williams, "Nanoscale patterning for the formation of extensive wires," US Patent No Specification 6407443 B2, 2002.
    • Chen, Y.1    Williams, R.S.2
  • 14
    • 44049104488 scopus 로고    scopus 로고
    • Apparatus for imprinting lithography and fabrication thereof,
    • US Patent No Specification 7,141,866
    • Y. Chen, and R. S. Williams, "Apparatus for imprinting lithography and fabrication thereof," US Patent No Specification 7,141,866, 2006.
    • (2006)
    • Chen, Y.1    Williams, R.S.2
  • 15
    • 42549130896 scopus 로고    scopus 로고
    • th IEEE Conference on Nanotechnology IEEE-Nano-2006, Cincinnati, 2006, 2, pp. 576-579.
    • th IEEE Conference on Nanotechnology IEEE-Nano-2006, Cincinnati, 2006, vol. 2, pp. 576-579.
  • 17
    • 0030370262 scopus 로고    scopus 로고
    • Sacrificial etching of III-V compounds for micromechanical devices
    • K. Hjort, "Sacrificial etching of III-V compounds for micromechanical devices," J. Micromech. Microeng., vol. 6, pp. 370-375, 1996.
    • (1996) J. Micromech. Microeng , vol.6 , pp. 370-375
    • Hjort, K.1
  • 18
    • 0034268805 scopus 로고    scopus 로고
    • Chemical vapor deposition of fluoroalkylsilane monolayer films for adhesion control in microelectromechanical systems
    • T. M. Mayer, M. P. de Boer, N. D. Shinn, P. J. Clews, and T. A. Michalske, "Chemical vapor deposition of fluoroalkylsilane monolayer films for adhesion control in microelectromechanical systems," J. Vac. Sci. Technol. B, vol. 18, pp. 2433-2440, 2000.
    • (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 2433-2440
    • Mayer, T.M.1    de Boer, M.P.2    Shinn, N.D.3    Clews, P.J.4    Michalske, T.A.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.