Sacrificial etching of III-V compounds for micromechanical devices

Journal of Micromechanics and Microengineering

Volumn 6, Issue 4, 1996, Pages 370-375

  Hjort, Klas ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

HETEROJUNCTIONS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; OPTOELECTRONIC DEVICES; SEMICONDUCTING FILMS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR MATERIALS;

ETCHANTS; MICROMECHANICAL DEVICES; SACRIFICIAL ETCHING; SACRIFICIAL LAYERS; STOPPING LAYERS; SURFACE MICROMACHINING;

ETCHING;

EID: 0030370262     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/6/4/003     Document Type: Article

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