Pattern generation by using multi-step room-temperature nanoimprint lithography

IEEE Transactions on Nanotechnology

Volumn 6, Issue 6, 2007, Pages 639-644

  Harrer, Stefan ^a,b   Yang, Joel K W ^a   Salvatore, Giovanni A ^a,c   Berggren, Karl K ^a   Ilievski, Filip ^d   Ross, Caroline A ^d  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c POLITECNICO DI TORINO   (Italy)

^d Massachusetts Institute of Technology   (United States)

Author keywords

Multi step; Nanoimprint lithography; Quasi arbitrary patterns; Room temperature

Indexed keywords

IMPRINT POLYMER LAYERS; MULTI STEP; PATTERN GENERATION; QUASI ARBITRARY PATTERNS; REACTIVE-ION ETCHING; ROOM TEMPERATURE;

ETCHING; PATTERN RECOGNITION; POLYSTYRENES; SILICON;

NANOIMPRINT LITHOGRAPHY;

ETCHING; LITHOGRAPHY; SILICON;

EID: 36349032909     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2007.907769     Document Type: Article

References (8)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, "Imprint lithography with 25-nanometer resolution," Science, vol. 272, pp. 85-87, 1996.
2. M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, "Step and flash imprint lithography: a new approach to highresolution patterning," SPIE Conference on Emerging Lithographic Technologies III, vol. 3676, pp. 379-389, 1999.
3. D.-Y. Khang, H. Yoon, and H. H. Lee, "Room-temperature imprint lithography," Adv. Mater., vol. 13, pp. 749-752, 2001.
4. D. Pisignano, L. Persano, P. Visconti, R. Cingolani, G. Gigli, G. Barbarella, and L. Favaretto, "Oligomer-based organic distributed feedback lasers by room-temperature nanoimprint lithography," Appl. Phys. Lett., vol. 83, pp. 2545-2547, 2003.
5. E. Mele, D. Pisignano, M. Mazzeo, L. Persano, and G. Gigli, "Roomtemperature nanoimprinting on metallo-organic complexes," J. Vac.Sci. Technol. B, vol. 22, pp. 981-984, 2004.
6. E. Mele, F. Di Benedetto, L. Persano, R. Cingolani, and D. Pisignano, "Multilevel, room-temperature nanoimprint lithography for conjugated polymer-based photonics," Nano Letters, vol. 5, pp. 1915-1919, 2005.
7. M. L. Schattenburg, R. J. Aucoin, and R. C. Fleming, "Optically matched trilevel resist process for nanostructure fabrication," J. Vac. Sci. Technol. B., vol. 13, pp. 3007-3011, 1995.
8. T. M. Mayer, M. P. de Boer, N. D. Shinn, P. J. Clews, and T. A. Michalske, "Chemical vapor deposition of fluoroalkylsilane monolayer films for adhesion control in microelectromechanical systems," J. Vac. Sci. Technol. B, vol. 18, pp. 2433-2440, 2000.