Nanofabrication with controllable localization energy based on the interference modulation of surface plasmons

Optics Express

Volumn 16, Issue 19, 2008, Pages 14404-14410

  Wei, Xingzhan ^a   Du, Chunlei ^a   Dong, Xiaochun ^a   Luo, Xiangang ^a   Deng, Qiling ^a   Zhang, Yudong ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; MODULATION; PHOTORESISTS;

DESTRUCTIVE INTERFERENCE; EXPOSURE ENERGY; FDTD SIMULATIONS; INTERFERENCE MODULATION; LOCALIZATION ENERGY; ONE CHIP; ORDERS OF MAGNITUDE; SURFACE PLASMONS;

PLASMONS;

ARTICLE; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; METHODOLOGY; NANOTECHNOLOGY; REFRACTOMETRY; SURFACE PLASMON RESONANCE; THEORETICAL MODEL;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; MODELS, THEORETICAL; NANOTECHNOLOGY; REFRACTOMETRY; SURFACE PLASMON RESONANCE;

EID: 51849127005     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.014404     Document Type: Article

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