메뉴 건너뛰기




Volumn , Issue , 2008, Pages 604-609

A new insight into the dynamic fluctuation mechanism of stress-induced leakage current

Author keywords

Dynamic fluctuation; Random telegraph noise; RTN; SILC; Stress induced leakage current

Indexed keywords

RELIABILITY;

EID: 51549094797     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RELPHY.2008.4558953     Document Type: Conference Paper
Times cited : (19)

References (18)
  • 1
    • 33750601335 scopus 로고    scopus 로고
    • Direct Evaluation of Gate Line Edge Roughness Impact on Extension Profiles in Sub-50-nm n-MOSFETs
    • H. Fukutome, Y. Momiyama, T. Kubo, Y. Tagawa, T. Aoyama, and H. Arimoto, "Direct Evaluation of Gate Line Edge Roughness Impact on Extension Profiles in Sub-50-nm n-MOSFETs", IEEE Trans. on Electron Devices, vol. 53, 2006, pp. 2755-2763.
    • (2006) IEEE Trans. on Electron Devices , vol.53 , pp. 2755-2763
    • Fukutome, H.1    Momiyama, Y.2    Kubo, T.3    Tagawa, Y.4    Aoyama, T.5    Arimoto, H.6
  • 2
    • 33845871174 scopus 로고    scopus 로고
    • Effect of Discrete Dopant Distribution on MOSFETs Scaling into the Future
    • Y. Ashizawa and H. Oka, "Effect of Discrete Dopant Distribution on MOSFETs Scaling into the Future", in Proc. of the SISPAD, 2005, pp. 31-34.
    • (2005) Proc. of the SISPAD , pp. 31-34
    • Ashizawa, Y.1    Oka, H.2
  • 5
    • 0023548492 scopus 로고
    • A meta-stable leakage phenomenon in DRAM charge storage - Variable hold time
    • D. S. Yaney, C. Y. Lu, R. A. Kohler, M. J. Kelly, and J. T. Nelson, "A meta-stable leakage phenomenon in DRAM charge storage - Variable hold time", in IEDM Tech. Dig., 1987, pp. 336-339.
    • (1987) IEDM Tech. Dig , pp. 336-339
    • Yaney, D.S.1    Lu, C.Y.2    Kohler, R.A.3    Kelly, M.J.4    Nelson, J.T.5
  • 7
    • 3042515082 scopus 로고    scopus 로고
    • Thermal Degradation of DRAM Retention Time: Characterization and Improving Techniques
    • Y. I. Kim, K. H. Yang, and W. S. Lee, "Thermal Degradation of DRAM Retention Time: Characterization and Improving Techniques", in Proc. of the IRPS, 2004, pp. 667-668.
    • (2004) Proc. of the IRPS , pp. 667-668
    • Kim, Y.I.1    Yang, K.H.2    Lee, W.S.3
  • 9
    • 33847702868 scopus 로고    scopus 로고
    • The Origin of Variable Retention Time in DRAM
    • Y. Mori, K. Ohyu, K. Okonogi, and R. Yamada, "The Origin of Variable Retention Time in DRAM", in IEDM Tech. Dig., 2005, pp. 1034-1037.
    • (2005) IEDM Tech. Dig , pp. 1034-1037
    • Mori, Y.1    Ohyu, K.2    Okonogi, K.3    Yamada, R.4
  • 12
    • 0038648962 scopus 로고    scopus 로고
    • Variable stress-induced leakage current and analysis of anomalous charge loss for flash memory application
    • R. Yamada and T. J. King, "Variable stress-induced leakage current and analysis of anomalous charge loss for flash memory application" in Proc. of the IRPS, 2003, pp. 491-496.
    • (2003) Proc. of the IRPS , pp. 491-496
    • Yamada, R.1    King, T.J.2
  • 13
    • 0001415641 scopus 로고    scopus 로고
    • Field and Cycling dependence of Anomalous Charge Loss in Flash Memory Cells
    • D. Wellekens, P. Hendrickx, F. Schuler, and J. V. Houdt, "Field and Cycling dependence of Anomalous Charge Loss in Flash Memory Cells" in Proc. of the NVSMW, 2001, pp. 120-122.
    • (2001) Proc. of the NVSMW , pp. 120-122
    • Wellekens, D.1    Hendrickx, P.2    Schuler, F.3    Houdt, J.V.4
  • 14
    • 0034430319 scopus 로고    scopus 로고
    • Fast-bit-limited lifetime modeling of advanced floating gate non-volatile memories
    • A. Scarpa, G. Tao, J. Dijkstra, and F. G. Kuper, "Fast-bit-limited lifetime modeling of advanced floating gate non-volatile memories" in Proc. of the IRW, 2000, pp. 24-28.
    • (2000) Proc. of the IRW , pp. 24-28
    • Scarpa, A.1    Tao, G.2    Dijkstra, J.3    Kuper, F.G.4
  • 15
    • 0035017469 scopus 로고    scopus 로고
    • A new conduction mechanism for the anomalous cells in thin oxide flash EEPROMs
    • A. Modelli, F. Gilardoni, D. Ielmini, and A. S. Spinelli, "A new conduction mechanism for the anomalous cells in thin oxide flash EEPROMs" in Proc. of the IRPS, 2001, pp. 61-66.
    • (2001) Proc. of the IRPS , pp. 61-66
    • Modelli, A.1    Gilardoni, F.2    Ielmini, D.3    Spinelli, A.S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.