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Volumn , Issue , 2003, Pages 491-496

Variable stress-induced leakage current and analysis of anomalous charge loss for flash memory application

Author keywords

Anomalous cell; Anomalous SILC; Erratic; Fast bit; Flash memory; Moving bit; Random telegraphic noise; Retention time; SILC

Indexed keywords

ELECTRIC CHARGE; FLASH MEMORY; MOS CAPACITORS;

EID: 0038648962     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (14)

References (12)
  • 2
    • 0034430319 scopus 로고    scopus 로고
    • Fast-bit-limited lifetime modeling of advanced floating gate nonvolatile memories
    • A. Scarpa, G. Tao, J. Dijkistra, and F. G. Kuper, "Fast-bit-limited Lifetime Modeling of Advanced Floating Gate Nonvolatile Memories," in Proceedings of the IRW, 2000, pp. 24-28.
    • (2000) Proceedings of the IRW , pp. 24-28
    • Scarpa, A.1    Tao, G.2    Dijkistra, J.3    Kuper, F.G.4
  • 3
    • 0035017469 scopus 로고    scopus 로고
    • A new conduction mechanism for anomalous cells in thin oxide flash EEPROMs
    • A. Modelli, F. Gilardoni, D. Ielmini and A. Spinelli, "A New Conduction Mechanism for Anomalous Cells in Thin Oxide Flash EEPROMs," in Proceedings of the IRPS, 2001, pp. 61-65.
    • (2001) Proceedings of the IRPS , pp. 61-65
    • Modelli, A.1    Gilardoni, F.2    Ielmini, D.3    Spinelli, A.4
  • 6
    • 0035717578 scopus 로고    scopus 로고
    • A model for anomalous leakage current n flash memories and its aplication for the predicton of retention characteristics
    • Kenji Okada, "A Model for Anomalous Leakage Current n Flash Memories and Its Aplication for the Predicton of Retention Characteristics," in Proceedings of the IEDM, 2001, pp. 707-710.
    • (2001) Proceedings of the IEDM , pp. 707-710
    • Okada, K.1
  • 8
    • 0034873613 scopus 로고    scopus 로고
    • Physical origin of SILC and noisy breakdown in very thin silicon nitride gate dielectric
    • I. Polishchuk, T.-J. King, and C. Hu, "Physical Origin of SILC and Noisy Breakdown in Very Thin Silicon Nitride Gate Dielectric," in Proceedings of 59-th Device Research Conference, 2001, pp. 20-21.
    • (2001) Proceedings of 59-th Device Research Conference , pp. 20-21
    • Polishchuk, I.1    King, T.-J.2    Hu, C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.