Residual stress in obliquely deposited MgF2 thin films

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Jaing, Cheng Chung ^a   Liu, Ming Chung ^b   Lee, Cheng Chung ^b   Cho, Wen Hao ^b   Shen, Wei Ting ^a   Tang, Chien Jen ^b   Liao, Bo Huei ^b  

^a MINGHSIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MICROSTRUCTURE; RESIDUAL STRESSES; RESISTIVE EVAPORATION; SUBSTRATES;

ANISOTROPIC STRESS; COLUMNAR MICROSTRUCTURES; DEPOSITION ANGLE; GLASS SUBSTRATES; RESISTIVE HEATING;

THIN FILMS;

EID: 50849113154     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C266     Document Type: Article

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