Investigation of thermal annealing of optical properties and residual stress of ion-beam-assisted TiO2 thin films with different substrate temperatures

Applied Optics

Volumn 45, Issue 13, 2006, Pages 3091-3096

  Lee, Cheng Chung ^a   Chen, Hsi Chao ^a   Jaing, Cheng Chung ^b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b MINGHSIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ION BEAM ASSISTED DEPOSITION; OPTICAL PROPERTIES; OXYGEN; RESIDUAL STRESSES; STOICHIOMETRY; SUBSTRATES; TEMPERATURE DISTRIBUTION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANNEALING TEMPERATURE; EXTINCTION COEFFICIENT; STABLE OXIDES; SUBOXIDES; SUBSTRATE TEMPERATURE;

TITANIUM OXIDES;

EID: 33745014668     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.003091     Document Type: Article

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