Low energy secondary ion mass spectrometry with sub-keVO2 + beams at glancing incidence

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 5, 2008, Pages 1120-1127

  Jiang, Z X ^a   Kim, K ^a   Guenther, T ^a   Robichaud, B ^a   Benavides, J ^a   Contreras, L ^a   Sieloff, D D ^a  

^a FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPTH RESOLUTION; GLANCING INCIDENCE;

BORON; BORON COMPOUNDS; CHLORINE COMPOUNDS; ELECTROLYSIS; GERMANIUM; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; IONS; MASS SPECTROMETERS; MASS SPECTROMETRY; NITRIDES; NONMETALS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING GERMANIUM COMPOUNDS; SILICON; SILICON ALLOYS; SPECTROMETERS; SPECTROMETRY; SPECTRUM ANALYSIS;

SURFACE ANALYSIS;

EID: 50849093880     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2952449     Document Type: Article

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