Errors in near-surface and interfacial profiling of boron and arsenic

Applied Surface Science

Volumn 231-232, Issue , 2004, Pages 618-631

  Vandervorst, W ^a   Janssens, T ^a   Brijs, B ^a   Conard, T ^a   Huyghebaert, C ^a   Fruhauf J ^a   Bergmaier, A ^b   Dollinger, G ^b   Buyuklimanli, T ^c   VandenBerg, J A ^d   Kimura, K ^e  

^a IMEC   (Belgium)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c Evans East   (United States)

^d UNIVERSITY OF SALFORD   (United Kingdom)

^e KYOTO UNIVERSITY   (Japan)

Author keywords

Arsenic and boron segregation; Depth resolution; ERDA; Oxygen bombardment; SIMS; Surface peak

Indexed keywords

ANNEALING; ARSENIC; BORON; DIFFUSION; DOPING (ADDITIVES); INTERFACES (MATERIALS); SECONDARY ION MASS SPECTROMETRY; SENSITIVITY ANALYSIS;

ARSENIC AND BORON SEGREGATION; DEPTH RESOLUTION; OXYGEN BOMBARDMENT; SURFACE PEAKS;

SURFACE CHEMISTRY;

EID: 2942593896     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.03.125     Document Type: Conference Paper

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