Energy distribution of ions bombarding TiO2 thin films during sputter deposition

Surface and Coatings Technology

Volumn 138, Issue 1, 2001, Pages 77-83

  Martin, N ^a,b   Santo, A M E ^a   Sanjines R ^a   Levy F ^a  

^a EPFL   (Switzerland)

^b Chemia De l'Epitaphe ^*  (Switzerland)

Author keywords

Energy distribution; Intrinsic ion bombardment; Sputtering; Titanium oxide

Indexed keywords

FILM GROWTH; ION BOMBARDMENT; MICROSTRUCTURE; NEGATIVE IONS; REFRACTIVE INDEX; X RAY DIFFRACTION ANALYSIS;

IONS IMPINGING;

THIN FILMS;

ENERGY; SPUTTERING; TITANIUM DIOXIDE;

EID: 0035795061     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01127-0     Document Type: Article

References (28)