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Volumn 58, Issue 2, 2000, Pages 327-334
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Oxygen-ion-assisted deposition of TiO films
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
AUGER ELECTRON SPECTROSCOPY;
CRYSTAL STRUCTURE;
CRYSTALLINE MATERIALS;
FILM GROWTH;
ION BEAMS;
MICROELECTRONICS;
PHASE COMPOSITION;
THIN FILMS;
TITANIUM OXIDES;
VAPOR DEPOSITION;
X RAY CRYSTALLOGRAPHY;
ANTIDIFFUSION EFFICIENCY;
ION-ASSISTED PHYSICAL VAPOR DEPOSITION;
SEMICONDUCTING FILMS;
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EID: 0034245859
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0042-207X(00)00186-X Document Type: Article |
Times cited : (40)
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References (11)
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