Erratum to "Rapid synthesis of tantalum oxide dielectric films by microwave assisted atmospheric chemical vapor deposition" [Thin Solid Films 516 (2008) 8307-8314] (DOI:10.1016/j.tsf.2008.03.049);Rapid synthesis of tantalum oxide dielectric films by microwave microwave-assisted atmospheric chemical vapor deposition

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8307-8314

  Ndiege, Nicholas ^a   Subramanian, Vaidyanathan ^a   Shannon, Mark A ^a   Masel, Richard I ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Microwave deposition; Rapid dielectric synthesis; Thick Ta2O5 film

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL EQUIPMENT; CHEMICAL VAPOR DEPOSITION; DEPOSITION RATES; DIELECTRIC MATERIALS; FILM GROWTH; HIGH-K DIELECTRIC; MICROWAVES; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; TANTALUM OXIDES; X RAY DIFFRACTION;

ATMOSPHERIC CHEMICAL VAPOR DEPOSITIONS; DEPOSITION SURFACE; HIGH DEPOSITION RATES; INEXPENSIVE EQUIPMENT; MICROWAVE ASSISTED; MICROWAVE ASSISTED CHEMICAL VAPOR DEPOSITIONS; OXIDE DIELECTRIC; POST-DEPOSITION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 50849088972     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.10.034     Document Type: Erratum

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