Reduction of surface roughness by Ta2O5 film formation with O2 cluster ion assisted deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 870-874

  Fujiwara, Y ^a   Toyoda, N ^a   Mochiji, K ^a   Mitamura, T ^a   Yamada, I ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Average roughness; Cluster ion; Sputtering; Ta2O5

Indexed keywords

ION BEAM ASSISTED DEPOSITION; OXYGEN; STOICHIOMETRY; TANTALUM COMPOUNDS; THIN FILMS;

CLUSTER IONS;

SURFACE ROUGHNESS;

EID: 0038074375     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00881-4     Document Type: Conference Paper

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