Deposition of SiO2 and Ta2O5 films by electron-beam-excited plasma ion plating

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 401-403

  Toki, Kazuyuki ^a   Kusakabe, Kazutoshi ^a   Odani, Tadayoshi ^a   Kobuna, Sadatoshi ^a   Shimizu, Yasushi ^a  

^a JEOL LTD   (Japan)

Author keywords

Coatings; Ion plating; Optical coating; Plasma processing and deposition

Indexed keywords

DEPOSITION; ELECTRON BEAMS; FILM PREPARATION; MICROSTRUCTURE; OPTICAL COATINGS; OPTICAL PROPERTIES; OXIDES; PLASMA APPLICATIONS; PLATING; SILICA; STOICHIOMETRY; TANTALUM COMPOUNDS;

ELECTRON BEAM EXCITED PLASMA; PLASMA ION PLATING; REFRACTORY METAL OXIDES; VACUUM CHAMBER;

THIN FILMS;

EID: 0030219509     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08691-9     Document Type: Article

References (4)

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4. T. Hara, M. Hamagaki, A. Sanda, Y. Aoyagi and S. Namba, J. Vac. Sci. Technol., B5 (1987) 366.