Extreme ultraviolet resist outgassing and its effect on nearby optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Denbeaux, Gregory ^a   Garg, Rashi ^a   Mbanaso, Chimaobi ^a   Waterman, Justin ^a   Yankulin, Leonid ^a   Antohe, Alin ^a   Fan, Yu Jen ^a   Montgomery, Warren ^a   Dean, Kim ^b   Orvek, Kevin ^b   Wüest, Andrea ^b   Wei, Yayi ^c   Goodwin, Frank ^b,c   Wood, Obert ^d   Koay, Chiew Seng ^e   Gullikson, Eric ^f   Aquila, Andy ^f   Tarrio, Charles ^g   Grantham, Steven ^g   Bajt, Saša ^h  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b SEMATECH   (United States)

^c Qimonda   (United States)

^d AMD   (United States)

^e IBM   (United States)

^f LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^g NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^h DESY   (Germany)

Author keywords

EUV; Extreme ultraviolet; Optics contamination; Outgassing; Witness plate

Indexed keywords

EUV; EUV OPTICS; EUV RADIATION; EUV RESISTS; EXPOSURE DOSE; EXPOSURE TOOL; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; RESIST COMPONENTS; VACUUM ENVIRONMENT; WITNESS PLATE;

DEGASSING; EXTREME ULTRAVIOLET LITHOGRAPHY; PHOTORESISTS;

OPTICS;

EID: 50149105391     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772670     Document Type: Conference Paper

References (8)

1. Denbeaux et al., "Quantitative Measurement of EUV Resist Outgassing, " Proc. SPIE 6533, 2007.
2. Kim R. Dean et al., "EUV resist outgassing: how much is too much, " Journal of Photopolymer Science and Technology, Vol. 20 (2007), No. 3 393-402.
3. Kim R. Dean et al., "An analysis of EUV Resist Outgassing Measurements, " Proc SPIE 6519, 2007.
4. H.F. Dylla, "Glow discharge techniques for conditioning high vacuum systems, " J. Vac. Sci. Technol. A. Vol 6, No. 3, 1988.
5. H.F. Dylla et al., "Glow discharge conditioning of the PDX vacuum vessel, " J. Vac. Sci. Technol., Vol 17, No. 1, 1980.
6. J. S. Hu et al., "Oxygen glow discharge experiment to removed deposited layers and to release trapped hydrogen isotopes in HT-7 superconducting tokomak, " Journal of Nuclear Materials, vol. 350, 2006.
7. R. Garg et al., "EUV Optics contamination studies in presence of different hydrocarbons, " Proc. SPIE 6921, 2008.
8. Sasa Bajt et al., "Improved reflectance and stability of Mo/Si multilayer mirrors, " Optical Engineering 41(08), 2002.