Performance of the full field EUV systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Meiling, Hans ^a   Boon, Edwin ^a   Buzing, Nico ^a   Cummings, Kevin ^b   Frijns, Olav ^a   Galloway, Judy ^b   Goethals, Mieke ^c   Harned, Noreen ^b   Hultermans, Bas ^a   De Jonge, Roel ^a   Kessels, Bart ^b   Kürz, Peter ^d   Lok, Sjoerd ^a   Lowisch, Martin ^d   Mallman, Joerg ^a   Pierson, Bill ^b   Ronse, Kurt ^c   Ryan, James ^e   Smitt Weaver, Emil ^b   Tittnich, Michael ^e   Wagner, Christian ^b   Van Dijk, Andre ^b   Zimmerman, John ^b   more..

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

^c IMEC   (Belgium)

^d CARL ZEISS SMT AG   (Germany)

^e STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

Devices; EUV lithography; High volume manufacturing; Resist images; System performance; Tin sources

Indexed keywords

CONTACT HOLES; CUSTOMER FACILITIES; DEVICES; DISCHARGE SOURCE; EXPOSURE TOOL; FIELD SIZE; FULL-FIELD; HIGH VOLUME MANUFACTURING; LITHOGRAPHY TOOLS; PERFORMANCE DATA; PROCESS DEVELOPMENT; RESIST IMAGE; SYSTEM PERFORMANCE;

EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; TIN;

EQUIPMENT;

EID: 67149101887     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773259     Document Type: Conference Paper

References (9)

1. B. La Fontaine, et al., "The use of EUV lithography to produce demonstration devices", this conference (2008).
2. G.F Lorusso, et al., "Imaging performance of the EUV alpha demo tool at IMEC", this conference (2008).
3. N. Harned et al. "EUV lithography with the Alpha Demo Tools: status and challenges", SPIE Symposium on Emerging Lithographic Technologies XI, (2007).
4. H. Meiling, H. Meijer, V. Banine, R. Moors, R. Groeneveld, H.J. Voorma, U. Mickan, B. Wolschrijn, B. Mertens, G.van Baars, P. Kürz, and N. Harned, "First performance results of the ASML alpha demo tools", SPIE Symposium on Emerging Lithographic Technologies X, Vol. 6151 (2006).
5. H. Meiling, V. Banine, N. Harned, B. Blum, P. Kürz, and H.Meijer, "Development of the ASML EUV alpha demo tool", SPIE Symposium on Emerging Lithographic Technologies IX, Vol. 5751, p. 90 (2005).
6. H. Meiling, V. Banine, P. Kürz, and N. Harned, "Progress in the ASML EUV program", SPIE Symposium on Emerging Lithographic Technologies VIII, Vol. 5374, p. 31 (2004).
7. H. Meiling, V. Banine, P. Kürz, B. Blum, G.J. Heerens, and N. Harned, "The EUV Program at ASML: an update", SPIE Symposium on Emerging Lithographic Technologies VII, Vol. 5037, p. 24 (2003).
8. H. Meiling, J.P.H. Benschop, R. Hartman, P. Kürz, P. Høghøj, R. Geyl, and N. Harned, "EXTATIC, ASML's α-tool development for EUVL", SPIE Symposium on Emerging Lithographic Technologies VI, Vol. 4688, p. 52 (2002).
9. H. Meiling, J.P.H. Benschop, U. Dinger, and P. Kürz, "Progress of the EUVL alpha tool, " SPIE Symposium on Emerging Lithographic Technologies V, Vol. 4343, p. 38 (2001).