Proton beam writing: A platform technology for nanowire production

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1343-1348

  Van Kan, J A ^a   Zhang, F ^a   Chiam, S Y ^a   Osipowicz, T ^a   Bettiol, A A ^a   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMS; ELECTRIC WIRE; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; ENERGY DISSIPATION; ENERGY TRANSFER; ION BOMBARDMENT; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOWIRES; PARTICLE BEAMS; PHOTORESISTS; PROTON BEAMS; PROTONS; SECONDARY EMISSION; X RAY LITHOGRAPHY;

DIRECT WRITE; ENERGY LOSSES; HIGH ASPECT RATIO; HIGH ENERGIES; HIGH-DENSITY; LOW ENERGIES; METALLIC NANOWIRES; NANOWIRE PRODUCTION; NATIONAL UNIVERSITY OF SINGAPORE; P-BEAM WRITING; PLATFORM TECHNOLOGY; PRIMARY BEAMS; PROTON-BEAM WRITING; PROXIMITY EFFECTS; RESIST MATERIALS; SECONDARY ELECTRONS; SIDE WALLS;

ION BEAM LITHOGRAPHY;

ELECTROPLATING; ENERGY TRANSFER; LITHOGRAPHY; PROTONS;

EID: 49949090035     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0514-y     Document Type: Conference Paper

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